Specification Table

Mandetory chemical and physical requirments American ASTM C1240-04 European EN 13263:2005 Canadian CAN/CSA A23.5-98 Japanese JIS A 6207 2000 Chinese GB/T18736-2002 Brazilian NBR 13956:1997 Korean KS F 2567 2003 Vietnamese TCXDVN 311-2003 Indian IS 15388:2003
SiO2(%) >85,0 >85 >85 >85 >85 >85 >85 >85 >85,0
SO3(%)   <2,0 <1,0 <3,0     <3,0    
CI   0,3   0,1 0,2   0,3    
Free Ca0   1,0   1,0          
MgO       5,0     5,0    
Free Si   0,4              
Available alkails(Na2O equivalent %) Report         1,5     1,5
Moisture(%) 3,0     3,0 3,0 3,0   3,0 3,0
Loss on Ignition 6,0 4,0 6,0 5,0 6,0 6,0 5,0 6,0 4,0
Specific Surface(m2/gram) 15 15-35   15 >15   15   15
Bulk density, undensified Report                
Pozzolanic Activity Index(%) 105 @7d, accel ,curing 105 @28d std curing  

95@7d >105@ 28d std curing

>85@28d   >95@7d,accel curing >85@7d >85,0 @7d,27oC curing
Retained on 45 micron sieve(%) <10   <10     <10 <5,0 <10 <10
Variation from average on 45 micron sieve(% points) <5               <5
Density(kg/m3) Report                
Autoclave expansion(%)     <0,2            
Foaming     No foam            
Dry mass (% points deviation from declared in slurry)   <2         <2    
Water requirment ratio(%)         <125